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Audited Supplier Lab Magnetron Sputter Coater With1500W DC Power Supply for Vinyl Nickel Coating
MAGNETRON SPUTTERING: OVERVIEW
Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate and incorporate into the growing film.
Single target DC magnetron sputtering coater equipment is a cost-effective magnetron sputtering coating equipment independently researched and developed by our company. It has the characteristics of standardization, modularization and customization. Magnetron targets can be selected from 1 inch, 2 inches and 3 inches, and customers can choose according to the size of the plated substrate; The power supply is a 1500W high-power DC power supply, which can be used for high-energy metal sputtering coating. According to experimental requirements, DC or RF power supplies of other specifications can also be selected to achieve coating operations of various materials.
Specifications of magnetron sputter coater:
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Single target DC magnetron sputtering coater |
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Sample Table |
Overall dimensions |
Φ 360 mm |
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Adjustable RPM |
1-20rpm adjustable |
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Target |
Target plane |
Circular plane target |
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Sputtering vacuum |
0.1Pa to 3Pa |
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Target diameter |
100 to 101.6mm |
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Target thickness |
3mm |
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Insulation voltage |
>2000V |
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Cable specifications |
SL-16 |
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Target head temperature |
<= 65 ºC |
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Vacuum chamber |
Inner wall treatment |
Electrolytic polishing |
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Cavity size |
Φ500mm x 500mm |
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Cavity material |
304 stainless steel |
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Viewing window |
Quartz window, φ100mm diameter |
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Opening method |
Side opening |
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Gas control |
Flow control |
Mass flowmeter, measuring range 0 ~ 100SCCM |
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Gas type |
Argon, nitrogen, oxygen and other gases are available |
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Regulator Valve Types |
Solenoid Regulator |
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Static state of regulator valve |
Normal close |
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Measuring linearity |
Plus or minus 1.5% F.S |
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Measurement repetition accuracy |
Plus or minus 0.2% F.S |
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Measure response time |
≤8 seconds (T95) |
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Working pressure |
0.3 MPa |
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Pressure resistant body |
3MPa |
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Working ambient temperature |
(5 ~ 45) ºC |
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Body material |
Stainless steel 316L |
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Leakage rate of body |
1×10-8Pa.m3/s |
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Pipe fittings |
1/4 "jacketed joints |
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Input/output signals |
0 to 5V |
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Power supply |
±15V (±5%) (+15V 50mA, -15V 200mA) |
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Overall dimensions mm |
130 (W) x 102 (H) x 28 (H) |
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Communication interface |
RS485 MODBUS protocol |
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DC power supply |
Power supply |
1500W |
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Film thickness measurement |
Power requirements |
DC:5V (±10%) Maximum current 400mA |
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Resolution |
±0.03Hz(5-6MHz), 0.0136A/measurement (aluminum) |
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Measurement accuracy |
±0.5% thickness +1 count |
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Measurement cycle |
100mS ~ 1S/ time (can be set) |
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Measuring range |
500,000 A (aluminum) |
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Crystal frequency |
6MHz |
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Communication interface |
RS-232/485 serial interface |
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Display bits |
8-bit LED display |
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Molecular pump |
Molecular pumping speed |
1200L/S |
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Rated speed |
24000rpm |
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Vibration value |
<= 0.1 um |
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Start-up time |
5min |
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Downtime |
7min |
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Cooling method |
Water cooling + air cooling |
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Cooling water temperature |
<=37ºC |
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Cooling water flow rate |
1L/min |
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Mounting direction |
Vertical ±5. |
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Air extraction interface |
150CF |
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Exhaust port |
KF40 |
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Front pump |
Pumping rate |
VRD-16 |
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Ultimate vacuum |
1Pa |
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Power supply |
AC:220V/50Hz |
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Motor power |
400W |
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Noise |
<=56db |
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Air extraction interface |
KF40 |
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Exhaust port |
KF25 |
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Valve |
Gate valve |
A gate valve is arranged between the vacuum chamber and the molecular pump |
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Cut-off valve |
A cut-off valve is installed between the molecular pump and the front stage |
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Side drain valve |
A side drain valve is installed between the vacuum chamber and the front stage |
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Bleeder valve |
An electromagnetic bleeder valve is installed on the vacuum chamber |
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Ultimate vacuum of the whole machine |
<=5X10-4Pa |
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Test target |
1 piece of nickel target 4 inches in diameter and 3mm thickness |
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1. WE have magnetron sputtering coater with 1 target, 2 targets, 3 targets, 4 targets, etc. The target can be designed at the top or bottom of the chamber.
2. 0-1000W DC or RF power target is available. Bias function is optional
3. Target size: 1-inch, 2-inch, 3-inch, 4-inch, etc.
4. Strong magnetic target and Pernanent magenetic target is optional
5. Magnetron sputtering coater with evaporation, E-beam is available
6. Customized service is always available!
WE can ship the magnetron sputter coater by land, by sea, by air, by express, also can arrange package and shipment according to your requirements.
Q. Are you manufacturer or trading company?
A. We are professional manufacturer of laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service.
Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.
Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.
Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.
Q. How to pay?
A. T T, L / C, D / P, etc.
Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.
IS MAGNETRON SPUTTERING THE RIGHT PROCESS FOR YOUR WORK?
Please get in touch and we can collaborate on your project.
How can we help you achieve your goals? What technical obstacles can our engineering team help you overcome? Please press the 'Get in Touch' button to get in contact with us, we'd be excited to hear about your research and help you in any way we can.
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