After-sales Service: | on-Line Service |
---|---|
Warranty: | One Year |
Type: | Magnetron Sputtering |
Coating: | Vacuum Coating |
Substrate: | Steel |
Certification: | CE |
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MAGNETRON SPUTTERING: OVERVIEW
Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate and incorporate into the growing film.
Single target magnetron sputter with DC pwoer supply for metal film coating
Single target DC magnetron sputtering coater equipment is a cost-effective magnetron sputtering coating equipment independently researched and developed by our company. It has the characteristics of standardization, modularization and customization. Magnetron targets can be selected from 1 inch, 2 inches and 3 inches, and customers can choose according to the size of the plated substrate; The power supply is a 1500W high-power DC power supply, which can be used for high-energy metal sputtering coating. According to experimental requirements, DC or RF power supplies of other specifications can also be selected to achieve coating operations of various materials.
Specifications of magnetron sputtering coating machine
Single target DC magnetron sputtering coating instrument | ||
Sample stage | Dimensions | φ185mm |
Heating range | Room temperature~500ºC | |
Adjustable speed | 1-20rpm adjustable | |
Sputter Gun | Target plane | Circular plane target |
Sputtering vacuum | 10Pa~0.2Pa | |
Target diameter | 50~50.8mm | |
Target thickness | 2~5mm | |
Insulation voltage | >2000V | |
Cable specifications | SL-16 | |
Target head temperature | <=65ºC | |
Vacuum Chamber | Inner wall treatment | Electrolytic polishing |
Cavity size | φ300mm × 300mm | |
Cavity material | 304 stainless steel | |
Observation window | Quartz window, diameter φ100mm | |
Open method | Top opening, cylinder auxiliary support | |
Gas System | Flow control | Mass flow meter, range 0~200SCCM argon gas |
Control valve type | Solenoid valve | |
Control valve static state | Normally closed | |
Measuring linearity | ±1.5%F.S | |
Measurement repeatability | ±0.2%F.S | |
Measuring response time | ≤8 second(T95) | |
Working pressure range | 0.3MPa | |
Valve body pressure | 3MPa | |
Working temperature | (5~45)ºC | |
Body material | Stainless steel 316L | |
Valve body leakage rate | 1×10-8Pa.m3/s | |
Pipe joints | 1/4″Compression fitting | |
Input and output signal | 0~5V | |
Power supply | ±15V(±5%)(+15V 50mA, -15V 200mA) | |
Overall dimensions mm | 130 (width) × 102 (height) × 28 (thickness) | |
Communication Interface | RS485 MODBUS protocol | |
DC power supply | Power | 500W |
Output voltage | 0~600V | |
Timing length | 65000 second | |
Start Time | 1~10 second | |
Film Thickness Monitor | Power requirements | DC:5V(±10%) Maximum current 400mA |
Resolution | ±0.03Hz(5-6MHz),0.0136Å / Measurement (aluminum) | |
Measurement accuracy | ±0.5% thickness + 1 count | |
Measurement period | 100mS~1S/time (can be set) | |
Measuring range | 500,000 Å (aluminum) | |
Crystal frequency | 6MHz | |
Communication Interface | RS-232/485 serial interface | |
Display digits | 8-digit LED display | |
Vacuum System | Molecular pump pumping speed | 80L/S |
Rated speed | 65000rpm | |
Vibration value | <=0.1um | |
Start Time | <=4.5min | |
Downtime | <7min | |
Cooling method | Air-cooled | |
Water Chiller | Cooling water temperature | <=37ºC |
Cooling water flow rate | 1L/min | |
Installation direction | Vertical ±5° | |
Suction port | 150CF | |
Exhaust connection | KF40 | |
Backup Pump | Pumping rate | 1.1L/S(VRD-4) |
Ultimate vacuum | 5×10-2Pa | |
Power supply | AC:220V/50Hz | |
Power | 400W | |
Noise | <=56db | |
Suction port | KF40 | |
Exhaust connection | KF25 | |
Release valve | Pneumatic and electronically controlled air release valve is installed on the vacuum chamber | |
The ultimate vacuum of the whole machine | <=5×10-4Pa | |
Vacuum chamber boost rate | <=2.5Pa/h | |
Software system | 1 set of monitoring and management software | |
Test target | 2 copper targets with a diameter of 2 inches and a thickness of 3 mm |
1. WE have magnetron sputtering coater with 1 target, 2 targets, 3 targets, 4 targets, target can be designed at the top or bottom of the chamber.
2. 1~1000W DC or RF power supply is available.
3. Different target material is optional
4. Magnetron sputtering coater with evaporation, e-beam is available
5. Customized magnetron sputterign coater is available
WE can ship the magnetron sputtering coating machine by land, by sea, by air, by express, also can arrange package and shipment according to your requirements.
Q. Are you manufacturer or trading company?
A. We are professional manufacturer of laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service.
Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.
Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.
Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.
Q. How to pay?
A. T T, L / C, D / P, etc.
Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.
IS MAGNETRON SPUTTERING THE RIGHT PROCESS FOR YOUR WORK?
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How can we help you achieve your goals? What technical obstacles can our engineering team help you overcome? Please press the 'Get in Touch' button to get in contact with us, we'd be excited to hear about your research and help you in any way we can.
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