| After-sales Service: | 12 Months |
|---|---|
| Warranty: | 12 Months |
| Type: | Coating Sputtering |
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
This is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design. The plasma sputtering target is a standard size of 2 inches. Customers can choose different configurations of 1~3 targets according to their needs to meet the different experimental needs of single-layer film or multilayer films of various materials.
The instrument is equipped with 150W DC high-voltage power supply, which can be used for metal sputter coating, especially for the coating of metals such as gold, silver and copper. This film coater is equipped with a gas connection for the introduction of protective gas. If the customer needs to pass the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.
Application of Dual target head plasma sputtering coater:
It can be used for metal sputter coating, especially for metal coatings such as gold, silver and copper.
| Product model | TN-PLZ180-II-DC-Q | |
| Sample stage | Size | 100mm |
| Distance from sample stage to target surface | 20~35mm height adjustable | |
| Rotating speed | 1~20rpm adjustable | |
| Heating temperature | ≤500ºC | |
| Temperature control accuracy | ±1ºC PID temperature control | |
| Plasma sputtering source | Quantity | 2 inches * 2 |
| Cooling method | Water cooling | |
| Vacuum chamber | Chamber size | φ180mm x 200mm |
| Observation window | Omnidirectional visibility | |
| Chamber material | High purity quartz | |
| Open method | Top cover removable | |
| Upper and lower cover material | 304 stainless steel | |
| Pumping port | KF16 | |
| Intake port | 1/4 inch ferrule connector | |
| Power configuration | Quantity | DC power supplyx1 |
| Output power | Max. 150W | |
| Sputtering power | 1200V | |
| Max. sputtering current | 50mA | |
| Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
| Pumping port | KF16 | |
| Exhaust interface | KF16 | |
| Pumping rate | 1.1L/s(4m3/h) | |
| Ultimate vacuum | ≥0.1Pa | |
| Vacuum measurement | Resistance vacuum gauge | |
| Others | Power supply | AC 220V 50Hz |
| Total power | 1.5kW/2kW | |
| Dimension | 570mm * 450mm * 500mm | |
| Weight | 30kg | |
Q. Are you a manufacturer or a trading company?
A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.
){kind=link}