Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film

Product Details
After-sales Service: 12 Months
Warranty: 12 Months
Type: Coating Production Line
Gold Member Since 2023

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  • Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film
  • Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film
  • Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film
  • Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film
  • Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film
  • Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
  • FAQ
Overview

Basic Info.

Model NO.
TN-PLZ180-III-DC-Q
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Sample Stage Size
100mm
Rotate Speed
1-20rpm Adjustable
Vacuum Chamber
Stainless Steel
Magnetron Sputtering Target Head
3 Magnetron Sputtering Heads
Heating Temperature
Max 500ºC
Cooling Mode
Water Cooling
The Highest Heating Temperature
500ºC
Temperature Control Accuracy
+/- 1.0 °c
Ank Capacity
9L
Vacuum Pump
a Set of Molecular Pump System, Using One-Button O
Cooling System
10L/Min
Transport Package
Fumigated Wooden Box
Specification
550*350*400
Trademark
TN
Origin
China
HS Code
8486209000
Production Capacity
200/Month

Product Description

Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper film

 
Product Description

Three target heads plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. The plasma sputtering target is a standard size of 2 inches. Customers can choose different configurations of 1~3 target heads according to their needs to meet the different experimental needs of single-layer film or multilayer films of various materials. The instrument is equipped with a 150W DC high-voltage power supply, which can be used for metal sputter coating, especially for the coating of metals such as gold, silver and copper. This film coater is equipped with a gas connection for the introduction of protective gas. The instrument adopts touch screen control, which is simple and intuitive to use. It can realize the operation of coating start and stop, switch target head position and baffle rotation with one button, which is very suitable for laboratory purchase.

This film coater is equipped with a two-stage rotary vane vacuum pump. It has the advantages of small volume, quick vacuuming and simple operation. If customers need to further improve the vacuum degree, you can contact the technician to select the molecular pump group to form a high vacuum system.


Application of three target heads plasma sputtering coater:
It can be used for metal sputter coating, especially for metal coatings such as gold, silver and copper.
Product Parameters
Product model TN-PLZ180-III-DC-Q
Sample stage Size 100mm
Distance from sample stage to target surface 20~35mm height adjustable
Rotating speed 1~20rpm adjustable
Heating temperature ≤500ºC
Temperature control accuracy ±1ºC PID temperature control
Plasma sputtering source Quantity 2 inches * 3
Cooling method Water cooling
Vacuum chamber Chamber size φ180mm x 200mm   
Observation window Omnidirectional visibility
Chamber material High purity quartz
Open method Top cover removable
Upper and lower cover material 304 stainless steel
Pumping port KF16
Intake port 1/4 inch ferrule connector
Power configuration Quantity DC power supplyx1
Output power Max. 150W
Sputtering power 1200V
Max. sputtering current 50mA
Vacuum system Vacuum pump type Dual-stage rotary vane vacuum pump
Pumping port KF16
Exhaust interface KF16
Pumping rate 1.1L/s(4m3/h)
Ultimate vacuum 0.1Pa
Vacuum measurement Resistance vacuum gauge
Others Power supply AC 220V  50Hz
Total power 1.5kW/2kW
Dimension 570mm * 450mm * 500mm
Weight 30kg
Detailed Photos

 

Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film

 
FAQ

Q. Are you a manufacturer or a trading company?

A. We are professional laboratory instrument manufacturers, have our own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?

A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?

A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?

A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?

A.T / T, L / C, D / P, etc., it is recommended to use Made-in-China Trade Guarantee.

Q. How is the package of goods? Delivery methods?

A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact us.

Triple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper FilmTriple Target Enhanced Plasma Vapor Deposition Vacuum Sputtering Coating Machine for Copper Film
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