Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film

Product Details
After-sales Service: on-Line Service
Warranty: One Year
Application: Industry, School, Lab
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  • Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film
  • Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film
  • Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film
  • Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film
  • Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film
  • Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
  • Company Profile
  • Packaging & Shipping
  • FAQ
  • Contact Us
Overview

Basic Info.

Model NO.
TN-PECVD-500T-SS
Customized
Customized
Certification
CE
Structure
Portable
Material
Stainless Steel
Type
Tubular Furnace
Product Name
Pecvd System
Chamber Material
SUS304
Chamber Size
500*500mm
Mass Flow Meter
Six Channel
RF Power
500W
Sample Stage
200mm
Sample Heating
Rt~1000c
Transport Package
Fumigated Wooden Box
Specification
1760x1390x1900
Trademark
TN
Origin
China
HS Code
8401200000
Production Capacity
20 Sets Per Month

Product Description

 lab PECVD system with 13.56Mhz frequency for silicon silicon nitride silicon dioxide thin film

Product Description

Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin FilmPlasma -enhanced chemical vapor deposition (PECVD) is a type of chemical vapor deposition characterized by the use of plasma activation at low temperatures to enhance the chemical vapor deposition reaction. The advantages of this method are that the deposition temperature is low, the deposition rate is fast, and the film produced has excellent electrical properties, good substrate adhesion and excellent step coverage.

PECVD vapor deposition application:
Plasma enhanced CVD systems can be used in: graphene preparation, sulfide preparation, nanomaterials preparation and other test sites. A variety of films such as SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano -silicon, SiC, diamond-like, etc. can be deposited on the surface of flake or similar shape samples, and P -type and N-type doped films can be deposited. The deposited film has good uniformity, compactness, adhesion and insulation. Widely used in cutting tools, high-precision molds, hard coatings, high-end decoration and other fields, PECVD vapor deposition  has a wide range of applications in ultra -large scale integrated circuits, optoelectronic devices, MEMS and other fields.
Product Parameters

Specifications of PECVD system

Model number TN-PECVD-500T-SS
Cavity size Phi 500 -
Warm zone length 200
Rf power supply 500W-
Temperature 1000  ºC
Pump for forestage Molecular pump set
Display type T
Warm zone I
Water cooler CW5200
Cavity material SS
Sample       heating
Heating temperature
Above   RT-1000ºC,   temperature   control   accuracy:   ±1.C,   using temperature control meter for temperature control;
Adjustable speed: 1-20rpm adjustable
Spray head size Φ90mm, the electrode  spacing  between the spray head and the sample 40-100mm  online continuous adjustable (can  be adjusted according to the process), and with a ruler index display
Sample Table 200mm diameter
Working vacuum for deposition 0.133-133Pa (can be adjusted according to process)
Top flange It can be lifted by motor, the substrate is easy to change, and there is a visual port
Substrate Table Linear and azimuth motion of the substrate table, substrate heating and temperature control, mounting table and touch screen control, substrate linear motion is manually controlled, and substrate rotation is controlled by DC motors
Vacuum chamber Front door opening type,  φ500mm X 500mm stainless steel
Observation window φ100mm with baffle
Mass flowmeter Six way mass flow meter
Number paths of gas Six paths
Pressure range 0.15 Mpa to 0.15 Mpa
Range 0 to 100 SCCM (oxygen)
0 to 100 SCCM (CF4)
0 to 200 SCCM (SF6)
0 to 200 SCCM (argon)
0 to 500 SCCM (other gases air)
0-500 SCCM (other gases nitrogen)
Flow control range Plus or minus 1.5%
Gas path material 304 stainless steel
Pipe joint 6.35mm bushing joint
Vacuum system Front pump: oil-free vacuum pump 4.7L/S
Molecular pump: 1200L/S
Measuring range 1 x 10-5 to 1 x 105Pa
Measurement accuracy 1 x 10-5 ~ 1 x 10-4Pa±40% reading
1 x 10-4 ~ 1 x 105Pa for a reading of ±20%
 
Detailed Photos

1. WE have CVD/PECVD machine with gas supply system+vacuum system+tube furnace + plasma generator.
2. Tube furnace (temperature) :1200C, 1400C, 1600C, customized temperature is avaliable.
3. Tube furnace (heating zone) :single zone, dual zone, triple zone, customized No. of heating zone is avaliable.
4. Tube Material: quartz, corundum, alloy, and other material of tube is customizable.
5. Tube with different diameter and length is customizable.
6. Plasma generator: 100W, 150W, 300W, 500W, 1000W, and other power of plasma generator is customizable.
7. Flowmeter: 1~3 or multi channel flow meter is optional based on your process.
Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin FilmLab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin FilmLab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film

Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin FilmLab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin FilmLab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film
Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film

Company Profile

Zhengzhou Tainuo Film Materials Co., Ltd. is a comprehensive company integrating design, research and development, production and sales.

Our company's main products are: spin coater, thermal evaporation coater, magnetron sputter coater, plasma sputter coater, E-beam evaporation coater, PLD pulse laser coating machine, plasma cleaner, CVD system, PECVD system, diamond wire cutting machine, melting furnace/stove, arc melting furnace, etc.

Our products are widely used in the field of materials science research. We have extensive cooperation with domestic universities, laboratories, and new material companies. It has been successfully exported to more than 20 countries and regions including the United States, the United Kingdom, Germany, Russia, Switzerland, Canada, Brazil, etc. and have established long-term cooperative relationships with local dealers.

If you are conducting materials research, please contact us and we will provide you with customized services to make your research experiments smoother!Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin FilmLab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film

Packaging & Shipping

We can ship the CVD, PECVD machine by sea, by air, by land and by Express, also we can arrange shipment according to your requirements.
Lab Pecvd System with 13.56MHz Frequency for Silicon Silicon Nitride Silicon Dioxide Thin Film

FAQ

Q. Are you manufacturer or trading company?
A. We are professional manufacturer of  laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service. 

Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.

Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.

Q. How to pay?
A. T T, L / C, D / P, etc.

Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.

Contact Us

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Please get in touch and we can collaborate to get you the answers and solutions you need.
How can we help you achieve your goals? What technical obstacles can our engineering team help you overcome? Please press the 'Get in Touch' button to get in contact with us, we'd be excited to hear about your research and help you in any way we can.

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