Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film

Product Details
After-sales Service: 12 Months
Warranty: 12 Months
Type: Coating Production Line
Gold Member Since 2023

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  • Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film
  • Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film
  • Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film
  • Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film
  • Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film
  • Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
  • Company Profile
  • FAQ
Overview

Basic Info.

Model NO.
TN-EBH500-SS
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Chamber Material
Steel
Upper Cover
PVC
Sample Stage
Gold-Plated Copper Plate, with Good Thermal Conduc
Operating Temperature
Rt-200ºC
Liquid Drain Pipe and Waste Liquid Tank
PTFE
Chucks
10/25/55/100mm
Operation Mode
7 Inch HD LCD Touch Screen
Material
Liquid or Colloidal
Thermocouple
S Type Thermocouple
Maximum Temperature
1700
Transport Package
Fumigated Wooden Box
Specification
290mmx365mmx260mm
Trademark
TN
Origin
China
HS Code
8486209000
Production Capacity
200/Month

Product Description

 
Product Description

Lab High Vacuum Electron Beam Evaporation Coating Machine
 

Electron beam (e-beam) Evaporation

During an e-beam evaporation process, current is first passed through a tungsten filament which leads to joule heating and electron emission. High voltage is applied between the filament and the hearth to accelerate these liberated electrons towards the crucible containing the material to be deposited. A strong magnetic field focuses the electrons into a unified beam; upon arrival, the energy of this beam of electrons is transferred to the deposition material, causing it to evaporate (or sublimate) and deposit onto the substrate. Adding a partial pressure of reactive gas, such as oxygen or nitrogen to the chamber during evaporation can be used to reactively deposit non-metallic films.

Electron beam evaporation has many advantages over resistive thermal evaporation. First, the e-beam source is capable of heating materials to much higher temperatures than is possible using a resistive boat or crucible heater. This allows for very high deposition rates and evaporation of high temperature materials and refractory metals such as tungsten, tantalum, or graphite. Second, films deposited by electron beam evaporation can better maintain the purity of the source material; water cooling of the crucible tightly confines the electron beam heating to only the area occupied by the source material, eliminating any unwanted contamination from neighbouring components. Finally, electron beam evaporation sources are available in a variety of sizes and configurations including single or multiple pockets. Pocket indexing using a motorized carousel allows one source to deposit many materials from a single source location.
E-beam evaporation is available on a variety of PVD platforms and for many applications, including metallization, dielectric coating, optical coatings, and Josephson junctions.
 
Product Parameters
 
Product name Electron beam evaporation coating machine
Product model CY-EBH500-SS
Service condition Ambient temperature ranged from 5 to 40ºC
Source Three phase 380V
Voltage 220V 50HZ
Power <20 kW
Water gage <2.5bar
Plated layer monitoring Using SQM160 membrane thickness monitor, the inhomogeneity of coating thickness is less than 6%.
Heat lamp Four halogen heating lamps were used for degassing and one neon lamp for lighting
The electrode interface With a 2-way metal evaporation electrode interface, backup
Water cooling system Water pressure monitoring
Observation window 100mm in diameter, with X-ray filter glass
Control system Touch screen system
Vacuum chamber dimensions Evaporation chamber dimensions: Φ 500 * H500mm
Electron gun New electronic gun, a 6-hole crucible
Sample turntable Sample size: <150mm, the sample table can rotate, the sample table surface and the electron gun surface distance adjustment up and down, the adjustment distance is 200mm-250mm, the sample table can be heated, heating temperature <500ºC.
System vacuum degree A. Limit vacuum: baking for 12~24 hours, continuous pumping, vacuum less than 5x10-5Pa
B. Extraction rate: a vacuum <5x10 in 40 minutes, starting from the atmosphere-4Pa
C. System leakage rate: after 12 hours of shutdown, measure the vacuum degree of the vacuum chamber is <10Pa
The vacuum unit FB1200 Molecular pump + VRD-16 front stage pump + side extraction valve + gate valve + cut-off valve + composite vacuum meter + coating monitoring vacuum meter interface (standby)

Notes:
1. Thermal evaporation coater with 1/2/3/4 evaporation sources for metal and organic material can be provided
2. Chamber material: High purity quartz / Stainless Steel SS304 chamber
3. Film thickness monitor is optional
4. Different material of evaporation source is available
5. The above can be customized according to your needs.

Detailed Photos

Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film
Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film


 
 

 

 

 

 

 
Company Profile

 

Electron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor FilmElectron Beam Evaporation Coating Machine for Semiconductive Film for Semiconductor Film


 

FAQ

Q. Are you a manufacturer or a trading company?

A. We are professional laboratory instrument manufacturers, having our own design team and factory with mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?

A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?

A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?

A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?

A.T / T, L / C, D / P, etc., it is recommended to use Made in China Trade Guarantee.

Q. How is the package of goods? Delivery methods?

A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact us.

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