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Audited Supplier MAGNETRON SPUTTERING: OVERVIEW
Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate and incorporate into the growing film.
Dual Target Head Vacuum Magnetron Sputtering Coater for metal film coating
1. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise;
Specifications of dual target magnetron sputtering coater
| Product Name | Dual Target Magnetron Sputtering System |
| Main Parts | 1. Rotating sample table 2. Standard sputtering target, DC*2, adjustable 3. Stainless steel vacuum chamber 4. Two-way mass flow controller 5. One set of 500W DC power supply 6. Vacuum system: rotary vane pump + turbo molecular pump + composite vacuum gauge |
| Vacuum Chamber | a) Inner wall processing: electrolytic polishing b) Chamber size: φ300mm×H500mm(old), φ500mm×H500mm(new) c) Chamber material: 304 stainless steel d) Watch window: φ100mm (with shutter) e) Opening mode: top open(old), front door open(new) |
| Substrate Table | a) Rotary+ heating (old), Rotary+ heating + lifting(new) b) heating up to 500C (Max.) b) Located at the bottom of chamber c) Dimension: φ150mm d) Rotate speed: 1-20rpm adjustable e) Coating distance is adjustable 50~200mm(new) |
| Sputtering Gun | a) Quantity: 2pcs, water cooling b) Permanent magnetic sputtering target, DC*2 c) Target material plane: circular plane target d) Applicable diameter of target: 2 inches, 0.1mm~5mm thickness e) Baffle: pneumatic baffle for each sputter gun f) Sputtering vacuum: 10Pa~0.1Pa g) Capable of co-sputtering of targets |
| Water Chiller | a) Quantity: 1 set b) Tank capacity: 9L c) Flow rate 10/min d) Lift head: Max.10m e) Cooling power: 50W/C |
| DC Power Supply | a) Quantity: 1 set b) Output power: 0~500W c) Output voltage: 0~600V d) Matching method: auto-match e) Reflected power: <=100W f) Power stability: ±0.1% g) Cooling method: forced cooling h) Working environment: -10ºC- 40ºC |
| RF Power Supply Optional |
a) Quantity: 2 sets b) Output power: 0~300W c) RF frequency: 13.56 MHz d) Matching method: auto-match e) Reflected power: <=100W f) Power stability: ±0.1% g) Cooling method: forced cooling h) Working environment: -10ºC- 40ºC |
| Bias Power Supply Optional |
a) Quantity: 1 set b) Output power: ≤1KW c) Max. output current: ≤1A d) Frequency: 40Khz e) Output waveform: unipolar DC pulse f) Regulation precision: ≤1% g) Working efficiency: ≥90% |
| Gas Control | a) Flow control: Single-way mass flow controller b) For Ar, with range of 0~200sccm c) Regulating valve type: electromagnetic regulating valve d) Regulating valve static condition: normal close |
| Vacuum System | Backing pump: a) Model: VRD-16 b) Pumping rate: 4.4L/s c) Power supply: 220V/50Hz Molecular pump: a) Pumping rate: 600L/s b) Rated rotating speed: 24000rpm c) Starting time: <=4.5min d) Cooling method: water cooling+air cooling e) Inlet interface: CF160 f) Outlet interface: KF40 Ultimate vacuum:<=5×10-4Pa Vacuum measurement: - Composite vacuum gauge Measuring range: 10-5Pa ~105Pa |
| Film Thickness monitor | a) Quantity: 1 set 4-channel film thickness monitor b) Each target comes with a probe,one probe for film thickness c) Film thickness resolution:0.0136Å(aluminum) d) Measuring range: 0~500,000 Å (aluminum) e) Accuracy of film thickness :±0.5% f) Measuring speed:100mS~1S/T(setting as request) g) Crystal frequency: 6MHz h) Mounting flange:CF35 i) Communication interface: RS-232/485 serial interface |
| Valves | a) A gate valve is installed between the vacuum chamber and the molecular pump b) A shut-off valve is installed between the molecular pump and the front stage c) A side valve is installed between the vacuum chamber and the front stage d) Electromagnetic bleed valve is installed on the vacuum chamber |
| Input power supply | Single phase AC220V, 50Hz |
| Operation | PLC+ touch screen control system |
| Leveling feet and castor wheels | Equipped with leveling feet in addition to castor wheels |
1. WE have magnetron sputtering coater with 1 target, 2 targets, 3 targets, 4 targets, target can be designed at the top or bottom of the chamber.
2. 0-1000W DC or RF target is available. Bias function is optional
3. Target size: 1-inch, 2-inch, 3-inch, 4-inch, etc.
4. Strong magnetic target and Pernanent magenetic target is optional.
5. Magnetron sputtering coater with evaporation, E-beam is available
6. Customized service is always available!
WE can ship the magnetron sputter coater by land, by sea, by air, by express, also can arrange package and shipment according to your requirements.
Q. Are you manufacturer or trading company?
A. We are professional manufacturer of laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service.
Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.
Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.
Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.
Q. How to pay?
A. T T, L / C, D / P, etc.
Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.
IS MAGNETRON SPUTTERING THE RIGHT PROCESS FOR YOUR WORK?
Please get in touch and we can collaborate on your project.
How can we help you achieve your goals? What technical obstacles can our engineering team help you overcome? Please press the 'Get in Touch' button to get in contact with us, we'd be excited to hear about your research and help you in any way we can.
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Audited Supplier 
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