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Audited Supplier Physical vapor deposition (PVD) describes various coating processes through condensation of vaporized material to create thin films on a substrate. All processes are vacuum-based. We like to introduce three kinds of processes: plasma sputtering, magnetron sputtering and thermal evaporation(including electron beam evaporation ). Each technology has different advantages, below we give you a short overview:
Magnetron sputtering uses a cathode with a permanent magnetic field to excite a dense plasma at the cathode surface. The target material, placed at the cathode surface, is physically sputtered by ion bombardment and gets deposited on the substrate surface. Thereby several process arrangements lead to different layer properties.
Sputtering with Single Magnetron
The process chamber contains one magnetron with rotating magnetic field with a target diameter larger than the substrate diameter. The arrangement allows thin films with high troughput.
Confocal Sputtering
The sputter arrangement consists of up to 4 Magnetrons, each with target diameter smaller than substrate diameter.The magnetrons can be combined for co-sputtering of alloys (different target materials) or for bipolar sputtering (same target materials). In order to achieve a homogeneous material mix on the substrate surface, a sufficiently fast substrate rotation is required.
Dynamic Sputter Deposition
The rotating substrate is moved linearly or orbitally over rectangular magnetrons to produce multilayer coatings. The individual emission profiles of the magnetrons are compensated by pre-calculation of the movement profiles, the layer thickness can be controlled by speed variation.
Thermal evaporation is a popular physical vapor deposition technique because of its simplicity. During this process, a material in a high-vacuum environment is heated to its evaporation point by joule heating of the resistive boat in which it is located. The vaporized molecules then travel from the source to the substrate where they nucleate together, forming a thin film coating. A wide variety of materials can be deposited using this technique such as aluminum, silver, nickel, chrome, magnesium, among many others.
Electron Beam (E-Beam) Evaporation
Current through a tungsten filament causes an electron emission, which is unified and accelerated to an electron beam by high voltage. A magnetic field deflects the e-beam so that it is focused into the crucible. The material in the crucible is bombarded with that e-beam and evaporates to a gaseous state for deposition on the substrate to be coated.
Q. Are you a manufacturer or a trading company?
A. We are professional laboratory instrument manufacturers, having our own design team and factory with mature technical experience, and can guarantee the quality of products and the optimal price.
Q. How is your company's product after-sales service system?
A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.
Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.
Q. Our country's power supply and plug are different. How do you solve it?
A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.
Q. How to pay?
A.T / T, L / C, D / P, etc., it is recommended to use Made in China Trade Guarantee.
Q. How is the package of goods? Delivery methods?
A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.
More questions, please contact us.
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