| After-sales Service: | on-Line Service |
|---|---|
| Warranty: | One Year |
| Type: | Magnetron Sputtering |
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High Vacuum Triple Target Magnetron Sputter Coater for Thin Film Coating Process
MAGNETRON SPUTTERING: OVERVIEW
Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate and incorporate into the growing film.
Features of magnetron sputter coater:
1. Triple target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable.
2. There are 1-inch, 2-inch and 3-inch magnetron targets. You can choose the target according to the size of the substrate to be coated.
3. The magnetron sputtering coater is equipped with 500W DC power and 500W RF power. The DC power is used for the conductrive materials, and the RF power is used for the insulating materials. Power from 300W to 1000W in according to your requirements.
4. The magnetron sputtering coater is equipped with two-channel high-precision mass flowmeter. Four-channel mass flowmeters is
available
5. The magnetron sputtering coater is equipped with turbo-molecular pump, and the ultimate vacuum is up to 10E-5Pa, other types of molecular pumps are available for purchase.
6. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without
shutting down the pump.
7. This product can be equipped with an integrated industrial computer to control the system.
8. The equipment is equipped with a vibration sample stage, which can turn the powder or particles on it irregularly, ensure that
the surface of all particles can be coated with film during the coating process. It's a PVD equipment that special designed for
granular samples.
Specifications of magnetron sputter coater:
| Product Name | Triple Target Magnetron Sputtering Coater | |
| Sample stage | Size | Dia.140mm |
| Heating temperature | Max 500ºC | |
| Temperature accuracy | ±1ºC | |
| Rotational speed | 1-20rpm adjustable | |
| Magnetron Sputtering Target | Quantity | 2"×3 (1",2" optional) |
| Cooling mode | Water cooling | |
| Water chiller | Circulating water chiller with flow rate of 10L/min | |
| Vacuum chamber | Chamber size | Dia.300mm×300mm |
| Chamber material | Stainless steel | |
| Watch window | Dia.100mm | |
| Opening mode | Top cover open | |
| Mass Flow Meter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |
| Vacuum system | Model | TN-GZK103-A |
| Molecular pump | 600L/s | |
| Backing pump | 1.1L/s | |
| Ultimate vacuum | 1.0E-5Pa | |
| Pumping interface | CF160 | |
| Exhaust interface | KF40 | |
| Vacuum measurement | Compound vacuum gauge | |
| Power supply | AC;220V 50/60Hz | |
| Pumping rate | vacuum up to 1.0E-3Pa in 20 minutes | |
| Power configuration | Quantity | DC power supply x2 RF power supply x1 |
| Max output power | DC 500 W, RF 300W | |
| Film Thickness | Quartz crystal film thickness monitor, Resolution: 0.1 Å | |
| Other parameters | Supply voltage | AC220V,50Hz |
| Total power | 4KW | |
| Overall size | 600mm×650mm×1280mm | |
| Total Weight | About 350kg | |
1. WE have magnetron sputtering coater with 1 target, 2 targets, 3 targets, 4 tagrst, etc. Target can be designed at the top or bottom of the chamber.
2. 0-1000W DC power or RF power target is available. Bias function is optional.
3. Target size: 1-inch, 2-inch, 3-inch, 4-inch, etc.
4. Strong magnetic target and Pernanent magenetic target is optional.
5. Magnetron sputtering coater with evaporation, E-beam is available.
6. Customized service is always available!
Zhengzhou Tainuo Film Materials Co., Ltd. is a comprehensive company integrating design, research and development, production and sales.
Our company's main products are: spin coater, thermal evaporation coater, magnetron sputter coater, plasma sputter coater, E-beam evaporation coater, PLD pulse laser coating machine, plasma cleaner, CVD system, PECVD system, diamond wire cutting machine, melting furnace/stove, arc melting furnace, etc.
Our products are widely used in the field of materials science research. We have extensive cooperation with domestic universities, laboratories, and new material companies. It has been successfully exported to more than 20 countries and regions including the United States, the United Kingdom, Germany, Russia, Switzerland, Canada, Brazil, etc. and have established long-term cooperative relationships with local dealers.
If you are conducting materials research, please contact us and we will provide you with customized services to make your research experiments smoother!
WE can ship the magnetron sputter coater by land, by sea, by air, by express, also can arrange package and shipment according to your requirements.
Q. Are you manufacturer or trading company?
A. We are professional manufacturer of laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service.
Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.
Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.
Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.
Q. How to pay?
A. T T, L / C, D / P, etc.
Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.
IS MAGNETRON SPUTTERING THE RIGHT PROCESS FOR YOUR WORK?
Please get in touch and we can collaborate on your project.
How can we help you achieve your goals? What technical obstacles can our engineering team help you overcome? Please press the 'Get in Touch' button to get in contact with us, we'd be excited to hear about your research and help you in any way we can.
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