| After-sales Service: | 12 Months |
|---|---|
| Warranty: | 12 Months |
| Application: | School, Lab |
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Plasma enhanced CVD system consists of a plasma generator, a three-heating zone tube furnace, a single-heating zone tube furnace, an RF power supply, and a vacuum system.
In order for the chemical reaction to take place at a lower temperature, the activity of the plasma is utilized to promote the reaction, and thus the CVD is called plasma enhanced chemical vapor deposition (PECVD). The PECVD graphene film preparation device ionizes a gas containing a film constituent atom by means of a RF output of 13.56 Mhz, forms a plasma in a vacuum chamber, utilizes strong chemical activity of the plasma, improves reaction conditions, and utilizes plasma activity to promote the reaction, then deposits a desired film on the substrate.
applications:
This equipment can be used in various test places such as graphene preparation, sulfide preparation, and nanometer material preparation. Various films such as SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano-silicon, SiC, diamond-like, etc. can be deposited on the surface of a sheet or similar shaped sample, and p-type and n-type doped films can also be deposited. The deposited film has good uniformity, compactness, adhesion, and insulation. It is widely used in the fields of cutters, high-precision molds, hard coatings, high-end decoration, etc.
| Vacuum tube furnace | Model | TN-PECVD50-1200-Q | |
| Tube material | High purity quartz | ||
| Tube diameter | 50mm | ||
| Tube length | 1000mm | ||
| Furnace chamber length | 660mm | ||
| Heating zone length | 200mm+200mm+200mm | ||
| Operating temperature | 0~1100ºC | ||
| Temperature control accuracy | ±1ºC | ||
| Temperature control mode | 30 or 50 segment program temperature control | ||
| Display mode | LED (highlight digital tube display) | ||
| Sealing method | 304 stainless steel vacuum flange | ||
| Flange interface | 1/4" cutting sleeve joint (Ø8 pagoda joint) | ||
| Vacuum | 4.4×10E-3Pa | ||
| Power supply | AC:220V 50/60Hz | ||
| Gas supply system | Model | TN-3F | |
| Gas channel | 3-channel | ||
| Measuring unit | Gas float flowmeter | ||
| Measuring range | A channel: 0~100ml H2 gas | The flow meter of the corresponding gas type and range can be selected according to customer's requirements | |
| B channel: 16~160ml N2 gas | |||
| C channel: 25~250ml Ar gas | |||
| measurement accuracy | ±2.0% | ||
| Pipe pressure resistance | 3MPa | ||
| Working pressure difference | 50~500KPa | ||
| Connecting pipe | 304 stainless steel | ||
| Gas channel | 304 stainless steel needle valve | ||
| Interface specification | 1/4" cutting sleeve joint for gas inlet and outlet | ||
| Exhaust system | Mechanical pump | GHD-031B | |
| Pumping rate | 4L/S | ||
| Exhaust interface | KF16 | ||
| Vacuum measurement | Pirani gauge | ||
| Ultimate vacuum | 1×10E-1Pa | ||
| Power supply | AC:220V 50/60Hz | ||
| Pumping interface | KF40 | ||
Related photos of PECVD Vacuum Furnace
Q. Are you a manufacturer or a trading company?
A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.
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